United Kingdom – Sondrel has announced that it is participating in two Mentor Graphics events in the USA and Israel. Sondrel’s IC design engineers have completed over 200 complex designs in advanced process geometries down to 14nm.
The Mentor Graphics User2User Conference in San Jose on April 10 is an interactive, in-depth technical conference aimed at sharing best practices, challenges and solutions across the entire Mentor Graphics user community. Gianvito Lorusso, Engineering Manager at Sondrel’s Milan office, is presenting a paper on the use of Olympus-SoC place and route software in a large 28nm design with over 70 million cells. He will detail the various design stages, including block development, chip assembly, low power management, and clock control, reviewing how the design’s timing closure and power management challenges were overcome. His presentation includes a discussion on the ECO capability of Olympus-SoC along with the Calibre InRoute interface to achieve final design signoff before Tape Out.
In Israel, Sondrel is participating as a partner of Mentor at the Mentor Forum conference and exhibition on March 25 at the Avenue Conference Center in Airport City. The company is showcasing its system-to-silicon capabilities. Shay Goldlust, head of Sondrel’s office in Tel Aviv, and his team will be on hand to discuss technical issues across design flow disciplines.
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