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Companies Collaborate to Develop PDKs for Critical Process Nodes

Mon, 03/22/2010 - 6:38am
MONROVIA, California and SEOUL, Korea -- Tanner EDA and Dongbu HiTek are jointly developing foundry-certified process development kits (PDKs) that will be integrated seamlessly into Tanner’s cohesive, integrated tool flow.

Designers using Tanner software solutions will have certified libraries to draw on as they create ICs at critical process nodes for production at Dongbu foundries, reducing design risk and providing faster time to market and higher quality of outcomes.

Dongbu HiTek has distinguished itself as a global A/MS technology leader since launching the world’s first foundry BCDMOS process at the 0.18 micron node in June 2008.

Tanner EDA is focused on providing innovative solutions to designers of breakthrough A/MS ICs. Driven by customer demand, jointly developed and maintained foundry-certified PDKs will deliver access to Dongbu HiTek’s 0.35 micron BCDMOS process on Tanner’s tool flow.

This BCDMOS process is appropriate for integrating analog circuits (using Bipolar), logic circuits (using CMOS) and high-voltage circuits (using DMOS) all on the same chip.

Joint development is ongoing. Tanner EDA and Dongbu HiTek anticipate the first set of foundry-certified PDKs in Q3, 2010, with additional PDKs available later in the year.

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