Tue, 10/26/2004 - 11:37am
Chartered introduces functional 0.13-micron 300-millimeter wafers from its Fab 7. Additionally, Chartered has launched engineering 300-mm wafers at Fab 7 for its 0.11-micron process, as well for the 90-nanometer platform it is jointly developing with IBM. Customers are utilizing Chartered's 0.13-micron solutions from Fab 6, a 200-mm facility, to deliver a broad variety of leading-edge and next-generation system-on-chip (SoC) products, such as high-performance graphics chips, storage and networking products, wireless local area network (WLAN) products, PC peripherals, and optical drives. Additionally, Chartered is offering its 0.11-micron process as an intermediary node to 0.13 micron from its Fab 6 and Fab 7. Chartered's 0.11-micron process offerings are achieved with a 10% shrink of Chartered's 0.13-micron design rule, and therefore, reduce implementation risks while lowering the cost per die. Chartered's 0.11-micron solutions support faster speed and enhanced performance, and are targeted for graphic chips, optical drives and high-speed SRAMs.
Chartered Semiconductor Manufacturing Ltd.